A pEek on the lab

Micro- and nanoscale materials and devices are fabricated in a class 100 clean room. Various deposition (including PECVD and PVD) and plasma etching tools, UV lithography, and an ion implanting tool are available.

Nanoscale devices can be patterned and characterized by Electron Beam (E-Beam) Lithography and Scanning Electron Microscopy (SEMs). The Chair for Micro- and Nanoelectronics is equipped with two SEMs, of which one can be used for wafer-scale E-Beam Lithography. Low kV Energy-Dispersive X-ray Spectroscopy (EDX) is also available.

Various deposition tools including low pressure and plasma-enhanced Chemical Vapor Deposition (LPCVD and PECVD), RF- and DC-sputter systems, thermal and electron beam evaporation as well as plasma etching tools (RIE and ICP) are available.

The Chair for Micro- and Nanoelectronics runs an ion-implanting tool for maximum dose of 1016 cm-2 and 350 keV. Evaporation and sputter-sources are available which allows for ion-implantation of a broad range of materials.

Several probe-stations for thin-film characterization are available, including a triaxial probe station for measurement of currents as low as fA, a 25 GHz-RF probe-station, photonic/plasmonic probe-stations with dark field imaging, a cryogenic probe-station (6 K to 350 K), a Laser Intensity Modulation probe-station for sub-um pyroelectric tomography, and a customized chamber for measurements in variable gas partial pressures.

Raphael Ahlmann, M.Sc.; doctoral researcher.