A pEek on the lab

Fundación IMDEA Nanociencia (Spain)

Contacts: Mariela MENGHINI, mariela.menghini@imdea.org
Amadeo VASQUEZ DE PARGA, al.vazquezdeparga@uam.es
Manuela GARNICA,

Web-site: https://www.nanociencia.imdea.org/


Center for Nanofabrication

Nanofabrication Center at IMDEA Nanociencia. Top Left: Main Class-1000 (ISO-6, 180 m2) fabrication area (metal thin film evaporators, Atomic Layer Deposition (ALD), an Inductively Coupled Plasma Reactive Ion etching (ICP-RIE), Reactive Ion Etching for Metals and Insulators (RIE), e-beam evaporator, among other techniques). Top Right: Wet chemistry room, Class-1000 (ISO-6). Bottom Left: Main Class-100 (ISO-5, 70 m2) Lithography room (electron beam Lithography (e-Beam), Focused Ion Beam Lithography (FIB), Gas Assisted Ion/Electron beam lithography (Multi-GIS), Maskless Optical lithography and Nano-Imprint Lithography and Mask aligner. Bottom Right: Class-100 wet chemistry room for lithography sample processing (resist spinning, curing or developing, optical microscope).

IMDEA Experimental Equipment

Scanning Tunneling Microscope

Low-Temperature Scanning Tunneling Microscope (4.8K-77K): The system consists of a series of Ultra High Vacuum chambers (UHV) containing the standard sample preparation facilities, including ion sputtering, sample annealing, material evaporators (atomic and molecular) and a quadrupolar mass spectrometer (QMS). It is also possible to perform Low Energy Electron Diffraction (LEED) as well as Auger Electron Spectroscopy (AES). The system is also equipped with a special STM tip preparation sub-chamber, allowing ion sputtering, annealing and material evaporation on the STM tips. The sample stage has four contacts that allow transport measurements while scanning tunnel spectroscopy and microscopy are performed.

Probe stations

Manual probe stations for electrical measurements at room temperature equipped with a Keithley 4200-SCS Parameter Analyzer and Keithley 2614B Sourcemeter.


Closed circuit and 4He flow cryostats for electro-optical and magneto-electrical measurements.

Left: Oxford closed circuit cryostat with working temperatures between 10 K and 300 K. Sample holder with 10 pins for electrical characterization of materials and optical windows allowing photoconductivity measurements.

Right: Cryogenic 4He flow cryostat for magneto-electrical characterization between 1.5 K and 300 K. Rotatable sample holder and superconducting solenoid for applying magnetic fields up to 9 T.

Closed circuit cryostat for electro-optical characterization down to 3.5 K.

AttoDry800 closed circuit optical cryostat. XYZ positioning motors with scanning range 30x30x10um and base temperature 3.5 K. This cryostat allows electro-optical characterization of materials as a function of temperature: current-voltage DC and RF, uRaman and uPhotoluminescence.

Materials growth and fabrication

Top: Chemical vapour deposition (CVD) furnace for graphene growth.

Bottom: Optical microscope and micromanipulators for exfoliation and deterministic transfer of 2D materials on substrates.



From left to right: Dr. Mariela Menghini (PI – Transport in 2D systems), Dr. Daniel Granados (PI – Quantum devices and photonics), Prof. Amadeo Vazquez de Parga (PI – Imaging of 2D materials), Dr. Manuela Garnica (PI – Topological surface states in quantum materials), Julia García (Research Assistant, 2D materials growth and device nanofabrication), Joan Ripoll (PhD student, Scanning tunneling microscopy and epitaxial growth of 2D materials).